Effect of Ge addition in the thermal stability and microstructure Ag/Ge/AlN nano-multilayer system

E. Klyatskina; C. Cancellieri; M. Chodi; L. Jeurgens; B. Straumal; J. Janczak-Rusch

doi:10.62721/diffusion-fundamentals.30.995

Effect of Ge addition in the thermal stability and microstructure Ag/Ge/AlN nano-multilayer system

Authors

E. Klyatskina
C. Cancellieri
M. Chodi
L. Jeurgens
B. Straumal
J. Janczak-Rusch

DOI:

https://doi.org/10.62721/diffusion-fundamentals.30.995

Keywords:

nano-multilayer system, temperature, microstructure

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Published

2017-12-01

How to Cite

[1]

E. Klyatskina, C. Cancellieri, M. Chodi, L. Jeurgens, B. Straumal, and J. Janczak-Rusch, “Effect of Ge addition in the thermal stability and microstructure Ag/Ge/AlN nano-multilayer system”, diffus. fundam., vol. 30, Dec. 2017, doi: 10.62721/diffusion-fundamentals.30.995.

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Issue

Vol. 30 (2017): Special Issue "Diffusion Fundamentals VII"

Section

Extended Abstracts

URN

http://nbn-resolving.org/urn:nbn:de:bsz:15-qucosa2-317318

License

This work is licensed under a Creative Commons Attribution 4.0 International License.