Thin LixSi Films Produced by Ion Beam Sputtering

Florian Strauß; Janek Binzen; Erwin Hüger; Paul Heitjans; Harald Schmidt

doi:10.62721/diffusion-fundamentals.21.807

Thin LixSi Films Produced by Ion Beam Sputtering

Authors

Florian Strauß
Janek Binzen
Erwin Hüger
Paul Heitjans
Harald Schmidt

DOI:

https://doi.org/10.62721/diffusion-fundamentals.21.807

Keywords:

lithium, ion, silicon

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Published

2014-11-01

How to Cite

[1]

F. Strauß, J. Binzen, E. Hüger, P. Heitjans, and H. Schmidt, “Thin LixSi Films Produced by Ion Beam Sputtering”, diffus. fundam., vol. 21, Nov. 2014, doi: 10.62721/diffusion-fundamentals.21.807.

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Issue

Vol. 21 (2014): Special Issue "Lithium in Solids: Structure and Dynamics"

Section

Extended Abstracts

URN

http://nbn-resolving.org/urn:nbn:de:bsz:15-qucosa2-324058

License

This work is licensed under a Creative Commons Attribution 4.0 International License.