Reaction-Diffusion in Co2Si/Zn Diffusion Couple
DOI:
https://doi.org/10.62721/diffusion-fundamentals.39.1275Keywords:
DiffusionAbstract
Periodic layered structures were examined in the Co₂Si/Zn diffusion couple annealed at 390 °C. SEM, TEM, EPMA, and XRD analyses revealed alternating Co–Si–rich and Zn–rich layers composed of CoSi, γ₁, and γ₂ phases with cell-to-cell variations in wavelength. The reaction zone thickness followed a parabolic time dependence, confirming diffusion-controlled growth governed by the Kirkendall effect. Three-dimensional FIB reconstruction showed complex layer morphologies, including branching and misalignment influenced by local diffusion pathways and grain orientations. EBSD measurements suggested no clear correlation between Co₂Si grain orientation and layer periodicity. These findings provide insight into multiphase reaction-diffusion mechanisms and the origin of periodic microstructures in the Co–Si–Zn system.
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