Near equilibrium in dissociative diffusion of nickel in silicon

Authors

  • Masayuki Yoshida
  • Hajime Kitagawa
  • Masami Morooka
  • Shuji Tanaka

DOI:

https://doi.org/10.62721/diffusion-fundamentals.6.107

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Published

2007-09-01

How to Cite

[1]
M. Yoshida, H. Kitagawa, M. Morooka, and S. Tanaka, “Near equilibrium in dissociative diffusion of nickel in silicon”, diffus. fundam., vol. 6, Sep. 2007, doi: 10.62721/diffusion-fundamentals.6.107.

Issue

Vol. 6 (2007): Special Issue "Diffusion Fundamentals II", First Part

Section

Extended Abstracts

URN

http://nbn-resolving.org/urn:nbn:de:bsz:15-qucosa-193854