Diffusion-barrier properties and thermal stability of TiAlSiCN, TiAlSiCN/SiBCN, and TiAlSiCN/AlOx films

Authors

  • Ph.V. Kiryukhantsev-Korneev
  • K.A. Kuptsov
  • T.B. Sagalova
  • N.V. Shvindina
  • A.V. Bondarev

DOI:

https://doi.org/10.62721/diffusion-fundamentals.30.1027

Keywords:

thermal stability, tialsicn

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Published

2017-12-01

How to Cite

[1]
P. Kiryukhantsev-Korneev, K. Kuptsov, T. Sagalova, N. Shvindina, and A. Bondarev, “Diffusion-barrier properties and thermal stability of TiAlSiCN, TiAlSiCN/SiBCN, and TiAlSiCN/AlOx films”, diffus. fundam., vol. 30, Dec. 2017, doi: 10.62721/diffusion-fundamentals.30.1027.

Issue

Vol. 30 (2017): Special Issue "Diffusion Fundamentals VII"

Section

Extended Abstracts

URN

http://nbn-resolving.org/urn:nbn:de:bsz:15-qucosa2-316684

License

Copyright (c) 2017 The author(s)

Creative Commons License

This work is licensed under a Creative Commons Attribution 4.0 International License.